High NA EUV makes its mass production debut: Intel produces the first Panther Lake chips using ASML technology

ASML has announced that Intel Foundry has reached a new milestone in the use of High NA EUV lithography, with the start of volume production of some Intel Core Ultra Series 3 processors, codenamed Panther Lake, manufactured using the Intel 18A process. This marks the first mass production of a logic chip using this lithographic technology, developed by ASML to increase precision in creating structures for advanced semiconductors.

The use of High NA EUV lithography applies to specific levels of the Intel 18A production process. According to Intel, the chips are produced with yield rates equivalent to those achieved with already deployed tools in production lines. High-NA (NA stands for Numerical Aperture) refers to EUV lithography machines with high numerical aperture, which feature lenses with a numerical aperture of 0.55 capable of a resolution of 8 nm, a significant improvement over the 13 nm of current EUV machinery. High-NA EUV systems are expected to avoid double patterning, reducing complexity in chip manufacturing with positive implications for costs and yields.

The announcement is the result of a collaboration between Intel and ASML that has been ongoing for years. In 2024, the Santa Clara company was the first to install the first commercial High NA EUV system at its research and development center in Hillsboro, Oregon. It was also the first company to complete the installation and acceptance testing of the second-generation TWINSCAN EXE:5200B system, an evolution of the EXE:5000 model characterized by greater productivity, improved overlay accuracy, and an updated light source.

According to Christophe Fouquet, President and CEO of ASML, the introduction of High NA EUV technology represents "a significant advancement in semiconductor lithography," thanks to the increased resolution and better process control, elements that enable the creation of smaller and denser structures, facilitating the development of applications related to artificial intelligence and other emerging sectors.

Intel also emphasizes the significance of this achievement. Naga Chandrasekaran, Executive Vice President and General Manager of Intel Foundry, explained that the qualification of the technology at certain levels of the Intel 18A process demonstrates how High NA EUV can be integrated into large-scale advanced production, increasing the capacity of existing plants while leaving open the possibility to fully leverage its potential in future production processes.

The announcement comes on the same day that ASML reported its financial results for the second quarter of 2026. The Dutch company recorded revenues of €9.326 billion, up from €8.767 billion in the previous quarter, with a net profit of €2.918 billion and a gross margin of 54%, both exceeding previous guidance. During the quarter, 86 new lithographic systems were sold, compared to 67 in the first quarter.

In light of market trends, ASML has revised its expectations upward for the entire year of 2026, predicting revenues between €43 billion and €45 billion and a gross margin between 54% and 56%. For the third quarter, the company expects sales between €11 billion and €12 billion.

According to Fouquet, the growth in investments in artificial intelligence and the ongoing advancement of related technologies are driving an ever-increasing demand for high-end logic and memory chips. This scenario is pushing semiconductor manufacturers to accelerate their expansion plans, providing ASML with greater visibility on long-term demand.

To respond to this growth, the company plans to increase the production capacity of Low NA EUV and DUV systems by 30% in 2027 compared to 2026 levels, with potential for further expansion of the same magnitude in 2028. At the same time, it will continue to expand its portfolio of upgrades for systems already installed at customer sites.